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TRIS(DIMETHYLAMINO)SILANE

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TRIS(DIMETHYLAMINO)SILANE Basic information

Product Name:
TRIS(DIMETHYLAMINO)SILANE
Synonyms:
  • TRIS(DIMETHYLAMINO)SILANE
  • n,n,n’,n’,n’’,n’’-hexamethyl-silanetriamin
  • n,n,n’,n’,n’’,n’’-hexamethylsilanetriamine
  • N,N,N’,N’,N’’,N’’-hexamethyl-Silanetriamine
  • TRIS(DIMETHYLAMINO)SILANE 99+%
  • N,N',N''-(Silanetriyl)tris(dimethylamine)
  • N,N',N''-Silanetriyltris(dimethylamine)
  • TRIS(DIMETHYLAMINO)SILANE, 99.9+%
CAS:
15112-89-7
MF:
C6H19N3Si
MW:
161.32
EINECS:
239-165-0
Product Categories:
  • ALD Precursors
  • organosilicon compounds
Mol File:
15112-89-7.mol
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TRIS(DIMETHYLAMINO)SILANE Chemical Properties

Melting point:
<0°C
Boiling point:
145 °C
Density 
0,838 g/cm3
refractive index 
1.4247
Flash point:
25°C
pka
10.93±0.70(Predicted)
form 
liquid
color 
colorless to light yellow
Specific Gravity
0.84
Hydrolytic Sensitivity
8: reacts rapidly with moisture, water, protic solvents
Sensitive 
air sensitive, moisture sensitive
EPA Substance Registry System
N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7)
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Safety Information

Hazard Codes 
F,C
Risk Statements 
10-36/37/38-52/53-34-29-20-15-11
Safety Statements 
16-26-36/37/39-45-43
RIDADR 
1993
WGK Germany 
3
RTECS 
VV5800000
TSCA 
Yes
Toxicity
rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989.
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TRIS(DIMETHYLAMINO)SILANE Usage And Synthesis

Uses

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

General Description

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