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ChemicalBook >  Product Catalog >  Organic Chemistry >  Organosilicon compounds >  1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane

1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane

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1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Basic information

Product Name:
1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane
Synonyms:
  • 1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane
  • 1,1,3,3,5,5-Hexaethoxy-1,3,5-Trisilinane
  • 1,3,5-Trisilacyclohexane, 1,1,3,3,5,5-hexaethoxy-
  • DKFELEX0087
  • DKSI070
CAS:
17955-67-8
MF:
C15H36O6Si3
MW:
396.7
Mol File:
17955-67-8.mol
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1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Chemical Properties

Boiling point:
133°C/5mmHg(lit.)
Density 
1.0512
refractive index 
1.4360 to 1.4400
form 
clear liquid
color 
Colorless to Almost colorless
Specific Gravity
1.0152
Hydrolytic Sensitivity
7: reacts slowly with moisture/water
InChI
InChI=1S/C15H36O6Si3/c1-7-16-22(17-8-2)13-23(18-9-3,19-10-4)15-24(14-22,20-11-5)21-12-6/h7-15H2,1-6H3
InChIKey
SPEDTQCGQOZHQP-UHFFFAOYSA-N
SMILES
[Si]1(OCC)(OCC)C[Si](OCC)(OCC)C[Si](OCC)(OCC)C1
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Safety Information

HS Code 
2931.90.9010
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1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane Usage And Synthesis

Uses

1,1,3,3,5,5-hexaethoxy-1,3,5-trisilacyclohexane is a known organosilane building block that can be used to synthesize PMO thin films[1] and EMA-2 materials[2]. PMO thin films can be used as one of the candidate materials for ultra-low-k dielectrics in microelectronic devices. Studies have shown that this building block is stable in acidic gels, but gradually opens when the gelation temperature and time exceed the "standard" conditions used for alkaline gels.

References

[1] F. GOETHALS. Ultra-low-k cyclic carbon-bridged PMO films with a high chemical resistance[J]. Journal of Materials Chemistry B, 2012, 77 1: 8281-8286. DOI:10.1039/C2JM30312D.
[2] QUANCHANG LI. Template-Free Self-Assembly of Mesoporous Organosilicas[J]. Chemistry of Materials, 2018, 30 7: 2218-2228. DOI:10.1021/acs.chemmater.7b04480.

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