Hafnium nitride Chemical Properties

Melting point:

3305°C

Density 

13.800

form 

yellow-brown cubic crystals

color 

yellow-brown cubic crystals, crystalline

Resistivity

33 (ρ/μΩ.cm)

Crystal Structure

Cubic

EPA Substance Registry System

Hafnium nitride (HfN) (25817-87-2)

Safety Information

WGK Germany 

3

MSDS

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Hafnium nitride Usage And Synthesis

Chemical Properties

Hafnium nitride (HfN) is formed as yellow-brown, cubic crystals and is prepared by heating hafnium metal to 1000–1500 C in an atmosphere of nitrogen or ammonia. It can also be prepared by reacting hafnium tetrachloride vapor with nitrogen in a hydrogen atmosphere at temperatures higher than 1000 C.

Hafnium nitride is a brittle solid. The deposition of a thin layer of hafnium nitride on steel grade, cemented carbide, cutting tools reduces frictional forces and wear, thus increasing the life of the tool by a factor of 6–8.

Physical properties

Hafnium nitride is the most refractory of all known nitrides. It forms yellowish-brown crystals with an fcc structure (a = 0.4518 nm) and exhibits exceptional hardness (1640 kgf/mm²) and electrical resistivity (33 μΩ·cm). It can be synthesized by heating hafnium in nitrogen (N₂) or ammonia (NH₃) at 1000–1500°C. With a purity of 99.5%, it is used as a sputtering target to enhance the electrical stability of diodes, transistors, and integrated circuits [KIR80, KIR81, HAW93, CER91].

Uses

Hafnium nitride exhibits outstanding mechanical, electrical, optical, high-temperature resistance, and corrosion resistance properties, making it highly valuable in fields such as mechanical manufacturing and microelectronics.
Nano-sized hafnium nitride finds widespread applications in the semiconductor, optoelectronics, and precision machining industries. In particular, nano-HfN thin films show great potential as high-efficiency anti-reflective protective coatings for optical windows, especially for critical optical components in aerospace systems.

Preparation

Hafnium nitride can be produced either through the direct reaction of hafnium with nitrogen at 900°C, or via the reaction of hafnium halides with ammonia or a nitrogen-hydrogen gas mixture.

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