TANTALUM ETHOXIDE Chemical Properties

Melting point:

21 °C(lit.)

Boiling point:

155 °C0.01 mm Hg(lit.)

Density 

1.566 g/mL at 25 °C(lit.)

refractive index 

n20/D 1.487(lit.)

Flash point:

87 °F

storage temp. 

2-8°C

solubility 

Soluble in organic solvents.

form 

liquid

Specific Gravity

1.56

Water Solubility 

Decomposes in water. Soluble in organic solvents.

Sensitive 

Moisture Sensitive/Air Sensitive

Hydrolytic Sensitivity

8: reacts rapidly with moisture, water, protic solvents

BRN 

3678999

CAS DataBase Reference

6074-84-6(CAS DataBase Reference)

EPA Substance Registry System

Ethanol, tantalum(5+) salt (6074-84-6)

Safety Information

Hazard Codes 

C,F

Risk Statements 

10-34

Safety Statements 

16-26-36/37/39-45

RIDADR 

UN 2920 8/PG 2

WGK Germany 

3

F 

3-8-10-21

TSCA 

No

HazardClass 

3

PackingGroup 

III

HS Code 

2905190019

MSDS

• Language:English Provider:SigmaAldrich
• Language:English Provider:ACROS
• Language:English Provider:ALFA

TANTALUM ETHOXIDE Usage And Synthesis

Description

Tantalum ethoxide can be used for the manufacture of tantalum (V) oxidethin-film materials using chemical vapor deposition, atomic layer deposition, and sol-gel processing. Those materials have applications in semiconductor, electrochromic and optical fields^1,2,3. In research filed, it can be used for the synthesis of some novel compounds such as oxo-alkoxide-carboxylates like Ta4O4(OEt)8(OOCCH3)4 with special molecular structure². It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage⁴.

Reference

1. Sukanya Murali, †, A. Anand Deshpande, and C. G. Takoudis. "Modeling of the Metalorganic Chemical Vapor Deposition of Tantalum Oxide from Tantalum Ethoxide and Oxygen." Industrial & Engineering Chemistry Research 44.16(2005): págs. 6387-6392.
2. Dong, L. U., et al. "Synthesis Method and Application of Tantalum (Ⅴ) Ethoxide" Guangzhou Chemical Industry (2016).
3. https://www.alfa.com/en/catalog/014643/

Chemical Properties

clear colorless to almost colorless liquid or

Uses

Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods

Uses

Tantalum(V) ethoxide acts as a precursor used in the preparation of ultra thin films of tantalum oxide and other tantalum containing films, which finds application in semiconductors. It is also used to prepare tantalum oxide nanoparticles for the imaging cartilage.

General Description

Tantalum(V) ethoxide Ta(OC₂H₅)₅ is a tantalum alkoxide that can be used as a precursor in the preparation of tantalum oxide by chemical vapor deposition (CVD). It has excellent volatility and thermal stability. It can be synthesized by anodic oxidation of tantalum plate in anhydrous ethanol.

Purification Methods

Purify it by distillation under reduced pressure. It aggregates in *C6H6,EtOH, MeCN, pyridine and diisopropyl ether. [Bradley et al. J Chem Soc 726 1955, Bradley et al. J Chem Soc 5 1956, Beilstein 1 IV 1312.]

TANTALUM ETHOXIDE(6074-84-6)Related Product Information

• LITHIUM TANTALUM ETHOXIDE,Lithium tantalum ethoxide, 5% w/v in ethanol, 99.9% (metals basis)
• POTASSIUM TANTALUM ISOPROPOXIDE
• TANTALUM(V) TETRAETHOXIDE 2,4-PENTANEDIONATE
• TANTALUM (V) ISOPROPOXIDE
• TANTALUM ETHOXIDE
• TANTALUM(V) BUTOXIDE
• LITHIUM TANTALUM TERT-BUTOXIDE
• LITHIUM TANTALUM ISOPROPOXIDE
• TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE
• Tantalum pentoxide
• Tantalum
• TANTALUM TETRAETHOXIDE DIMETHYLAMINOETHOXIDE
• Lithium tantalum ethoxide, 10% w/v in ethanol, 99.9% (metals basis)
• TANTALUM PENTA-SEC-BUTOXIDE
• TANTALUM PENTA-N-PROPOXIDE
• BARIUM TANTALUM ISOPROPOXIDE
• TANTALUM PENTA-I-BUTOXIDE
• STRONTIUM TANTALUM ISOPROPOXIDE