Basic information Safety Supplier Related

2-PHENYL-CYCLOPROPANECARBOXYLIC ACID

Basic information Safety Supplier Related

2-PHENYL-CYCLOPROPANECARBOXYLIC ACID Basic information

Product Name:
2-PHENYL-CYCLOPROPANECARBOXYLIC ACID
Synonyms:
  • Nsc245855
  • 1-Carboxy-2-phenylcyclopropane, (2-Carboxycycloprop-1-yl)benzene
  • AKOS B022610
  • AKOS MSC-0115
  • 2-PHENYL-CYCLOPROPANECARBOXYLIC ACID
  • TIMTEC-BB SBB003944
  • 1-Carboxy-2-phenylcyclopropane
  • 2-Phenylcyclopropane-1-carboxylic acid 95+%
CAS:
5685-38-1
MF:
C10H10O2
MW:
162.19
Mol File:
5685-38-1.mol
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2-PHENYL-CYCLOPROPANECARBOXYLIC ACID Chemical Properties

Melting point:
89-90 °C(Solv: water (7732-18-5))
Boiling point:
317.1±31.0 °C(Predicted)
Density 
1.250±0.06 g/cm3(Predicted)
storage temp. 
Sealed in dry,Room Temperature
form 
solid
pka
4.57±0.10(Predicted)
color 
White
InChI
InChI=1S/C10H10O2/c11-10(12)9-6-8(9)7-4-2-1-3-5-7/h1-5,8-9H,6H2,(H,11,12)
InChIKey
AHDDRJBFJBDEPW-UHFFFAOYSA-N
SMILES
C1(C(O)=O)CC1C1=CC=CC=C1
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Safety Information

Hazard Codes 
Xi
Hazard Note 
Irritant
HS Code 
2916399090
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2-PHENYL-CYCLOPROPANECARBOXYLIC ACID Usage And Synthesis

Synthesis

946-38-3

5685-38-1

In a 3000 mL round bottom flask, a methanol (600 mL) solution of ethyl cis-2-phenylcyclopropane-1-carboxylate (120 g, 0.63 mol, 1.00 eq.) was added, followed by a slow addition of a methanol (600 mL) solution of potassium hydroxide (177 g, 3.16 mol, 5.00 eq.). The reaction mixture was stirred at room temperature for 5 hours. Upon completion of the reaction, the reaction solution was concentrated in vacuum by rotary evaporator. The concentrated residue was diluted with 1000 mL of deionized water and the pH was adjusted to 2 with 2 M hydrochloric acid solution. the aqueous phase was extracted with dichloromethane (3 x 1000 mL), the organic layers were combined and washed with brine (1 x 1500 mL). Finally, the organic layer was concentrated in vacuum to give 2-phenylcyclopropanecarboxylic acid (100 g, 98% yield) as a white solid.

References

[1] Patent: WO2014/164867, 2014, A1. Location in patent: Paragraph 0254
[2] Helvetica Chimica Acta, 1986, vol. 69, p. 1655 - 1665

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