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DIETHYLSILANE

Basic information Description Sources Safety Supplier Related

DIETHYLSILANE Basic information

Product Name:
DIETHYLSILANE
Synonyms:
  • (C2H5)2SiH2
  • diethyl-silan
  • Silane, diethyl-
  • DIETHYLSILANE
  • Diethylsilanealso high purity
  • Diethylsilane, high purity min 99%
  • 3-Silapentane
  • Diethylsilane,98+%
CAS:
542-91-6
MF:
C4H12Si
MW:
88.22
EINECS:
208-834-9
Product Categories:
  • Pharmaceutical Intermediates
  • Reduction
  • Si (Classes of Silicon Compounds)
  • Si-H Compounds
  • Silicon Compounds (for Synthesis)
  • Synthetic Organic Chemistry
  • Organometallic Reagents
  • Organosilicon
  • Others
Mol File:
542-91-6.mol
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DIETHYLSILANE Chemical Properties

Melting point:
-132°C
Boiling point:
56 °C (lit.)
Density 
0.681 g/mL at 25 °C (lit.)
refractive index 
n20/D 1.391(lit.)
Flash point:
−20 °F
storage temp. 
under inert gas (nitrogen or Argon) at 2-8°C
solubility 
Miscible with terahydrofuran, diethyl ether, 1,4-dioxane and benzene.
form 
liquid
Specific Gravity
0.683
Hydrolytic Sensitivity
3: reacts with aqueous base
Sensitive 
Air Sensitive
Merck 
14,3128
BRN 
1730902
CAS DataBase Reference
542-91-6(CAS DataBase Reference)
EPA Substance Registry System
Silane, diethyl- (542-91-6)
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Safety Information

Hazard Codes 
F
Risk Statements 
11
Safety Statements 
16-23-24/25
RIDADR 
UN 1993 3/PG 2
WGK Germany 
1
TSCA 
Yes
HazardClass 
3
PackingGroup 
II

MSDS

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DIETHYLSILANE Usage And Synthesis

Description

Diethylsilane is a reagent used in the chemical vapor deposition of SiO2 for microelectronics. It is also used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It can also be used as a reductant in catalytic reduction of secondary amides to imines and secondary amines has been achieved using readily available iridium catalysts such as [Ir(COE)2Cl]2. This system requires low catalyst loading and shows high efficiency and an appreciable level of functional group tolerance. As a reduction agent, it also be used to convert polycarboxylic acids into their corresponding alkanes.

Sources

Levy, R. A., J. M. Grow, and G. S. Chakravarthy. "Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane." Cheminform 24.28(1993):851-854.
https://www.alfa.com/en/catalog/L16468/
https://www.sigmaaldrich.com/catalog/product/aldrich/423815?lang=en&region=US
https://pubs.acs.org/doi/full/10.1021/ja304547s#citing
Nimmagadda, Rama D., and C. Mcrae. Cheminform 37.35(2006):3505-3508.

Uses

Diethylsilane is used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It is also used in the chemical vapor deposition of SiO2 for microelectronics.

Application

Used in the ‘in-situ’ preparation of diborane and haloboranes.

DIETHYLSILANESupplier

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