Tert-Butyl 4-Vinylphenyl Carbonate
Tert-Butyl 4-Vinylphenyl Carbonate Basic information
- Product Name:
- Tert-Butyl 4-Vinylphenyl Carbonate
- Synonyms:
-
- 1,1-dimethylethyl4-ethenylphenylcarbonate
- 4-boc-styrene
- c-1566
- carbonicacid,1,1-dimethylethyl4-ethenylphenylester
- p-tert-butoxycarbonyloxystyrenemonomer
- 4-(tert-Butoxycarbonyloxy)styrene
- 4-(TERT-BUTOXYCARBONYLOXY)STYRENE;TERT-BUTYL P-VINYLPHENYL CARBONATE
- tert-Butyl p-vinylphenyl carbonate
- CAS:
- 87188-51-0
- MF:
- C13H16O3
- MW:
- 220.26
- Mol File:
- 87188-51-0.mol
Tert-Butyl 4-Vinylphenyl Carbonate Chemical Properties
- Melting point:
- 27-29 °C(lit.)
- Boiling point:
- 187 °C(lit.)
- Density
- 1.1101 (rough estimate)
- refractive index
- 1.5090 (estimate)
- Flash point:
- >230 °F
- InChI
- InChI=1S/C13H16O3/c1-5-10-6-8-11(9-7-10)15-12(14)16-13(2,3)4/h5-9H,1H2,2-4H3
- InChIKey
- GJWMYLFHBXEWNZ-UHFFFAOYSA-N
- SMILES
- C(OC1=CC=C(C=C)C=C1)(=O)OC(C)(C)C
- EPA Substance Registry System
- Carbonic acid, 1,1-dimethylethyl 4-ethenylphenyl ester (87188-51-0)
MSDS
- Language:English Provider:SigmaAldrich
Tert-Butyl 4-Vinylphenyl Carbonate Usage And Synthesis
Uses
Used as an intermediate in organic synthesis.
Application
Tert-Butyl 4-Vinylphenyl Carbonate (tBVPC) could be used to synthesize a terpolymer, which is a novel chemically amplified positive photoresist with methyl methacrylate (MMA)triphenylsulfonium salt methacrylate (TPSMA). In addition, Lithographic performance of a PAG-bound polymer resist based on tert-butyl 4-vinyl phenyl carbonate, n-[p-(t-butyloxycarbonyloxy) phenyl]maleimide terpolymers as a novel chemically amplified resist exhibited a positive working behavior. They showed 0.18 μm line pattern at electron beam lithography to indicate that the polymer bounded PAG resists have a potential to fabricate nanostructures[1].
Hazard
Moderately toxic by skin contact. A mild skin irritant.
Synthesis
Tert-Butyl 4-Vinylphenyl Carbonate was prepared by reacting 4-Hydroxystyrene with Di-tert-butyl dicarbonate in prestence of Tetramethylammonium hydroxide in water.
References
[1] Jae Beom Yoo . “Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography.” Polymer 55 16 (2014): Pages 3599-3604.
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