Bis(diethylamino)silane

Product Name: Bis(diethylamino)silane
CAS No.: 27804-64-4
Chemical Name: Bis(diethylamino)silane
Synonyms: BDEAS;SilanediaMide;amino)dihydrosiL;BIS(DIETHYLAMINO)SILANE;BDEAS: SiH2[N(CH2CH3)2]2;Bis(diethylamino)silane BDEAS;bis(diethylamino)dihydrosilane;Bis(diethylamino) Silane Liquid;N,N,N',N'-Tetraethylsilanediamine;N,N,N',N'-Tetraethylsilanediamine
CBNumber: CB32653773
Molecular Formula: C8H22N2Si
Formula Weight: 174.36
MOL File: 27804-64-4.mol

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Bis(diethylamino)silane Property

Boiling point:: 70°C (30mm)
Density: 0.804
form: liquid
pka: 10.31±0.70(Predicted)
Specific Gravity: 0.804
color: colorless
Sensitive: air sensitive, moisture sensitive
Hydrolytic Sensitivity: 8: reacts rapidly with moisture, water, protic solvents

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Hazard and Precautionary Statements (GHS)

Symbol(GHS)

Signal word

Danger

Hazard statements

H225Highly Flammable liquid and vapour

H260In contact with water releases flammable gases which may ignite spontaneously

H314Causes severe skin burns and eye damage

H335May cause respiratory irritation

Precautionary statements

P210Keep away from heat/sparks/open flames/hot surfaces. — No smoking.

P223Keep away from any possible contact with water, because of violent reaction and possible flash fire.

P231+P232Handle under inert gas. Protect from moisture.

P233Keep container tightly closed.

P240Ground/bond container and receiving equipment.

P241Use explosion-proof electrical/ventilating/lighting/…/equipment.

P242Use only non-sparking tools.

P243Take precautionary measures against static discharge.

P260Do not breathe dust/fume/gas/mist/vapours/spray.

P264Wash hands thoroughly after handling.

P264Wash skin thouroughly after handling.

P280Wear protective gloves/protective clothing/eye protection/face protection.

P301+P330+P331IF SWALLOWED: Rinse mouth. Do NOT induce vomiting.

P303+P361+P353IF ON SKIN (or hair): Remove/Take off Immediately all contaminated clothing. Rinse SKIN with water/shower.

P304+P340IF INHALED: Remove victim to fresh air and Keep at rest in a position comfortable for breathing.

P305+P351+P338IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

P310Immediately call a POISON CENTER or doctor/physician.

P321Specific treatment (see … on this label).

P335+P334Brush off loose particles from skin. Immerse in cool water/wrap in wet bandages.

P363Wash contaminated clothing before reuse.

P370+P378In case of fire: Use … for extinction.

P402+P404Store in a dry place. Store in a closed container.

P403+P235Store in a well-ventilated place. Keep cool.

P405Store locked up.

P501Dispose of contents/container to..…

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N-Bromosuccinimide Price

Strem Chemicals

Product number: 14-7030
Product name: Bis(diethylamino)silane, 97% BDEAS
Packaging: 5g
Price: $131
Updated: 2024/03/01

Strem Chemicals

Product number: 14-7030
Product name: Bis(diethylamino)silane, 97% BDEAS
Packaging: 25g
Price: $523
Updated: 2024/03/01

Strem Chemicals

Product number: 98-8810
Product name: Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
Packaging: 5g
Price: $190
Updated: 2024/03/01

Strem Chemicals

Product number: 98-8810
Product name: Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
Packaging: 25g
Price: $756
Updated: 2024/03/01

American Custom Chemicals Corporation

Product number: ORS0003332
Product name: BIS(DIETHYLAMINO)SILANE
Purity: 95.00%
Packaging: 5MG
Price: $500.75
Updated: 2021/12/16

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Bis(diethylamino)silane Chemical Properties,Usage,Production

Uses

Bis(diethylamino) silane (BDEAS) is a highly volatile precursor with a vapor pressure of 30 Torr at 70°C and is liquid at room temperature with a melting point of less than ?10°C and a boiling point of 188°C. It is studied and evaluated as a liquid-phase silicon precursor in the low-temperature atomic layer deposition (ALD) of hafnium silicate films. BDEAS and TDEAH are suitable precursors for the ALD of SiO2, HfO2, or HfSiOx films when used in conjunction with ozone. The composition of various HfSiOx films evaluated from RBS spectra demonstrates excellent tunability of film composition[1].

References

[1] Rajesh Katamreddy, C. Takoudis, B. Feist. “Bis(diethylamino) silane as the silicon precursor in the atomic layer deposition of HfSiOx.” Journal of The Electrochemical Society 155 1 (2008).

Bis(diethylamino)silane Preparation Products And Raw materials

Raw materials

Preparation Products

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Bis(diethylamino)silane Suppliers

China 47 Germany 1 United States 10 Global 58

Wuhan Hengxin Semiconductor Materials Co., Ltd

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J & K SCIENTIFIC LTD.

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INTATRADE GmbH

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Chizhou Kailong Import and Export Trade Co., Ltd.

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27804-64-4, Bis(diethylamino)silaneRelated Search:

BTBAS Bis(dimethylamino)dimethylsilane

SilanediaMide, N,N,N',N'-tetraethyl

BIS(DIETHYLAMINO)SILANE

BDEAS

Bis(diethylamino) Silane Liquid

Bis(diethylaMino)silane, 97% BDEAS

Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM

BDEAS: SiH2[N(CH2CH3)2]2

bis(diethylamino)dihydrosilane

SilanediaMine, N,N,N',N'-tetraethyl-

amino)dihydrosiL

Bis(diethylamino)silane BDEAS

SilanediaMide, N,N,N',N'-tetraethyl ISO 9001：2015 REACH

N,N,N',N'-Tetraethylsilanediamine

SilanediaMide

SilanediaMide, N,N,N',N'-tetraethyl

Silanediamine, N,N,N',N'-tetraethyl-

N,N,N',N'-Tetraethylsilanediamine

27804-64-4