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HAFNIUM TERT-BUTOXIDE

Product Name
HAFNIUM TERT-BUTOXIDE
CAS No.
2172-02-3
Chemical Name
HAFNIUM TERT-BUTOXIDE
Synonyms
1.5%-Zr);HAFNIUM T-BUTOXIDE;HAFNIUM TERT-BUTOXIDE;HAFNIUM (IV) T-BUTOXIDE;HAFNIUM TETRA-T-BUTOXIDE;Tetra-tert-butoxyhafnium;Hafnium(IV) tert-butoxide;Hafnium(4+) tert-butoxide;Tetrakis(t-butoxy)hafnium;Hafnium tetra-tert-butoxide
CBNumber
CB5137143
Molecular Formula
C16H36HfO4
Formula Weight
470.94
MOL File
2172-02-3.mol
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HAFNIUM TERT-BUTOXIDE Property

Melting point:
2℃
Boiling point:
90 °C5 mm Hg(lit.)
Density 
1.166 g/mL at 25 °C(lit.)
refractive index 
n20/D 1.424(lit.)
Flash point:
83 °F
solubility 
Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
form 
Liquid
Specific Gravity
1.166
Hydrolytic Sensitivity
7: reacts slowly with moisture/water
Sensitive 
Moisture Sensitive/Light Sensitive
Exposure limits
ACGIH: TWA 0.5 mg/m3
NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3
CAS DataBase Reference
2172-02-3(CAS DataBase Reference)
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Safety

Hazard Codes 
Xi
Risk Statements 
10-36/37/38
Safety Statements 
16-26
RIDADR 
UN 1993 3/PG 3
WGK Germany 
3
TSCA 
No
HazardClass 
3
PackingGroup 
II
HS Code 
2905190019
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Hazard and Precautionary Statements (GHS)

Symbol(GHS)
Signal word
Warning
Hazard statements

H226Flammable liquid and vapour

H315Causes skin irritation

H319Causes serious eye irritation

H335May cause respiratory irritation

Precautionary statements

P210Keep away from heat/sparks/open flames/hot surfaces. — No smoking.

P302+P352IF ON SKIN: wash with plenty of soap and water.

P305+P351+P338IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

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N-Bromosuccinimide Price

Sigma-Aldrich
Product number
760463
Product name
Hafnium(IV) tert-butoxide
Purity
packaged for use in deposition systems
Packaging
10G
Price
$1180
Updated
2023/06/20
Sigma-Aldrich
Product number
445541
Product name
Hafnium(IV) tert-butoxide
Purity
99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)
Packaging
5G
Price
$370
Updated
2023/06/20
Alfa Aesar
Product number
041908
Product name
Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.5%
Packaging
2g
Price
$131
Updated
2023/06/20
Alfa Aesar
Product number
041908
Product name
Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.5%
Packaging
10g
Price
$588
Updated
2023/06/20
Strem Chemicals
Product number
72-5800
Product name
Hafnium(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)
Packaging
2g
Price
$101
Updated
2024/03/01
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HAFNIUM TERT-BUTOXIDE Chemical Properties,Usage,Production

Uses

Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.

General Description

Atomic number of base material: 72 Hafnium

HAFNIUM TERT-BUTOXIDE Preparation Products And Raw materials

Raw materials

Preparation Products

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HAFNIUM TERT-BUTOXIDE Suppliers

China 29 Germany 3 India 1 Japan 2 Russia 1 Singapore 1 Switzerland 1 United Kingdom 4 United States 14 Global 56
HOKKO Chemical Industry Co.,Ltd.
Tel
--
Fax
--
Email
toiawase@hokkochem.co.jp
Country
Japan
ProdList
163
Advantage
73
Kojundo Chemical Laboratory Co., Ltd.
Tel
--
Fax
--
Country
Japan
ProdList
1440
Advantage
54
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View Lastest Price from HAFNIUM TERT-BUTOXIDE manufacturers

Hebei Weibang Biotechnology Co., Ltd
Product
HAFNIUM TERT-BUTOXIDE 2172-02-3
Price
US $0.00/KG
Min. Order
1KG
Purity
99%
Supply Ability
500000kg
Release date
2024-10-30

2172-02-3, HAFNIUM TERT-BUTOXIDERelated Search:

Hafnium(Ⅳ) oxide Hafnium oxide tert-Butanol 2-Butanol HAFNIUM (IV) I-PROPOXIDE MONOISOPROPYLATE HAFNIUM ETHOXIDE TETRAKIS(1-METHOXY-2-METHYL-2-PROPOXY)HAFNIUM HAFNIUM HAFNIUM TERT-BUTOXIDE HAFNIUM HYDRIDE

  • HAFNIUM (IV) T-BUTOXIDE
  • HAFNIUM T-BUTOXIDE
  • HAFNIUM TERT-BUTOXIDE
  • HAFNIUM TETRA-T-BUTOXIDE
  • Hafnium(IV) t-butoxide (99.9%-Hf)
  • Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%
  • Hafnium(IV) tert-butoxide
  • Hafnium(IV) tert-butoxide, 99.9% trace metals basis excluding Zr
  • hafnium(4+):2-methylpropan-2-olate
  • HafniuM(IV) t-butoxide (99.9%-Hf, <1.5%-Zr)
  • Hafnium tetrakis(t-butoxide)
  • Hafnium tetra-tert-butoxide
  • Hafnium(4+) tert-butoxide
  • Tetrakis(t-butoxy)hafnium
  • Tetrakis(tert-butoxy)hafnium
  • Tetra-tert-butoxyhafnium
  • 1.5%-Zr)
  • Hafnium(IV) t-butoxide (99.9%-Hf, &lt
  • HAFNIUM TERT-BUTOXIDE ISO 9001：2015 REACH
  • Hafnium tert-butoxide, 99.99%
  • 2172-02-3
  • 2172-2-3
  • HfOCCH334
  • 4C4H9OHf
  • metal alkoxide
  • Hafnium
  • Micro/Nanoelectronics
  • Solution Deposition Precursors