Basic information Safety Supplier Related

tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium

Basic information Safety Supplier Related

tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium Basic information

Product Name:
tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium
Synonyms:
  • (tert)-Butyliminotris(diethylamino)niobium
  • (T-BUTYLIMIDO)TRIS(DIETHYLAMINO)NIOBIUM(V),MIN.98%
  • (t-Butylimido)tris(diethylamino)niobium(V), min. 98%
  • (t-Butylimido)tris(diethylamino)niobium(V), min. 98% TBTDEN
  • t-Butylimido tris(diethylamido)niobium(V)
  • Tris(diethylamido)(tert-butylimido)niobium(V)
  • tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium
  • Tris(diethylamido)(tert-butylimido)niobium(V) packaged for use in deposition systems
CAS:
210363-27-2
MF:
C16H39N4Nb
MW:
380.42
Product Categories:
  • 1
Mol File:
210363-27-2.mol
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tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium Chemical Properties

Density 
1.015 g/mL at 25 °C
Flash point:
-3℃
form 
liquid
color 
brown
Sensitive 
air sensitive, moisture sensitive
InChI
1S/C4H9N.3C4H10N.Nb/c1-4(2,3)5;3*1-3-5-4-2;/h1-3H3;3*3-4H2,1-2H3;/q;3*-1;+3
InChIKey
CBCDPJRPMPTFKA-UHFFFAOYSA-N
SMILES
CCN(CC)[Nb](=NC(C)(C)C)(N(CC)CC)N(CC)CC
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Safety Information

Hazard Codes 
F,Xi
Risk Statements 
11-14/15-36/37/38
Safety Statements 
26-43
RIDADR 
UN3398 - DOT UN3399 class 4.3 - PG 2 - Organometallic substance, liquid, water-reactive, HI: all (not BR)
WGK Germany 
3
Storage Class
4.3 - Hazardous materials which set free flammable gases upon contact with water
Hazard Classifications
Eye Irrit. 2
Flam. Liq. 2
STOT SE 3
Water-react 2
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tris(N-ethylethanaminato)[2-methyl-2-propanaminato(2-)]-niobium Usage And Synthesis

Uses

Tris(diethylamido)(tert-butylimido)niobium(V) is used as a niobium precursor

  • In atomic layer deposition to create niobium-doped tin oxide (NTO), a conductive material. These NTO scaffolds provide a large surface area for thin platinum layers, improving electron transfer in dye-sensitized solar cells.
  • In metal-organic chemical vapor deposition (MOCVD) to grow niobium nitride (NbN) thin films. These films, deposited on silicon wafers, offers good conductivity and are suitable for electronic applications such as gate stacks.

reaction suitability

core: niobium

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