SILICON (IV) IODIDE
SILICON (IV) IODIDE Basic information
- Product Name:
- SILICON (IV) IODIDE
- Synonyms:
-
- SILICON IODIDE
- SILICON TETRAIODIDE, 99.9+%
- Silicon(IV)iodide,99.9%(metalsbasis)
- Silicon(IV)iodide(99.9%-Si)
- SILICON (IV) IODIDE
- SILICON TETRAIODIDE
- TETRAIODOSILANE
- SiI4
- CAS:
- 13465-84-4
- MF:
- I4Si
- MW:
- 535.7
- EINECS:
- 236-706-2
- Product Categories:
-
- metal halide
- Mol File:
- 13465-84-4.mol
SILICON (IV) IODIDE Chemical Properties
- Melting point:
- 120 °C
- Boiling point:
- 287.4 °C
- Density
- 4.198
- Flash point:
- 287.5°C
- form
- Lumps
- Specific Gravity
- 4.198
- color
- White
- Water Solubility
- Soluble in organic solvents. Insoluble in water.
- Sensitive
- Moisture Sensitive
- Hydrolytic Sensitivity
- 8: reacts rapidly with moisture, water, protic solvents
- CAS DataBase Reference
- 13465-84-4(CAS DataBase Reference)
- EPA Substance Registry System
- Silane, tetraiodo- (13465-84-4)
Safety Information
- Hazard Codes
- T
- Risk Statements
- 24/25-34-42/43-61
- Safety Statements
- 26-36/37/39-45-53
- RIDADR
- 3260
- TSCA
- Yes
- HazardClass
- 8
- PackingGroup
- II
MSDS
- Language:English Provider:ALFA
SILICON (IV) IODIDE Usage And Synthesis
Description
Silicon Iodide is the iodide of silicon. It is a precursor to silicon amide. It is also applied in the manufacture and etching of silicon in microelectronics. Selective area regrowth of silicon-doped GaAs has been successfully achieved by chemical beam epitaxy (CBE) on dry etched trench structures. Silicon tetraiodide is useful for the above process in abrupt to manipulate metal-semiconductor field effect transistor (MESFET) and heterostructure field effect transistor (HFET). Silicon iodide can also be reduced as the source to form pure silicon and hydrogen iodide.
Reference
- Izumi, Shigekazu, et al. Journal of Crystal Growth 175.175(1997): 404-410.
- http://jes.ecsdl.org/content/104/11/663.short
- https://en.wikipedia.org/wiki/Silicon_tetraiodide
Chemical Properties
White crystals. Noncombustible.
Uses
Silicon(IV) iodide is used as a precursor to prepare silicon amides. It finds application in the manufacture and etching of silicon in microelectronics.
Hazard
Toxic by ingestion and inhalation, irritant to tissue.
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