triethylindium

triethylindium Property

Melting point:

-31.9°C

Boiling point:

184°C

Density 

1.2600

refractive index 

1.5380

form 

liquid

EPA Substance Registry System

Indium, triethyl- (923-34-2)

Safety

RIDADR 

3203

HazardClass 

4.2

PackingGroup 

I

Hazard and Precautionary Statements (GHS)

Symbol(GHS)

Signal word

Danger

Hazard statements

H250Catches fire spontaneously if exposed to air

H314Causes severe skin burns and eye damage

Precautionary statements

P210Keep away from heat/sparks/open flames/hot surfaces. — No smoking.

P222Do not allow contact with air.

P260Do not breathe dust/fume/gas/mist/vapours/spray.

P264Wash hands thoroughly after handling.

P264Wash skin thouroughly after handling.

P280Wear protective gloves/protective clothing/eye protection/face protection.

P301+P330+P331IF SWALLOWED: Rinse mouth. Do NOT induce vomiting.

P302+P334IF ON SKIN: Immerse in cool water/wrap in wet bandages.

P303+P361+P353IF ON SKIN (or hair): Remove/Take off Immediately all contaminated clothing. Rinse SKIN with water/shower.

P304+P340IF INHALED: Remove victim to fresh air and Keep at rest in a position comfortable for breathing.

P305+P351+P338IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

P310Immediately call a POISON CENTER or doctor/physician.

P321Specific treatment (see … on this label).

P363Wash contaminated clothing before reuse.

P370+P378In case of fire: Use … for extinction.

P405Store locked up.

P422Store contents under …

P501Dispose of contents/container to..…

triethylindium Chemical Properties,Usage,Production

Uses

High-purity triethylin is the indium source used in techniques such as metal-organic chemical vapor deposition (MOCVD) and metal-organic molecular beam epitaxy (MOMBE) for growing semiconductor microstructures. In the semiconductor industry, it can be deposited alone or with at least one Group V element (mainly phosphorus and arsenic) as a gaseous hydride onto a suitable crystal matrix to produce semiconductor materials with extremely high performance. It is widely used abroad in the electronics industry to manufacture core components such as infrared detectors, microwave oscillators, and semiconductor photodiodes.

Safety Profile

Spontaneously flammable in air.