Flucetosulfuron Property

Melting point:

178–182°C

Density 

1.417±0.06 g/cm3(Predicted)

vapor pressure 

<1.86 × 10-5

solubility 

Solubility in organic solvents (g/l at 20 °C)
Acetone 22.9
Ethyl acetate 11.7
Dichloromethane 113.0
Dimethylformamide 265.0
Dimethylsulfoxide 211.7
n‐Hexane 0.006
Methanol 3.8

pka

Dissociation constant (pKa at 20 °C) 3.5

Water Solubility 

Solubility in water (g/l at 25 °C) 0.114 (pH 7)

Hazard and Precautionary Statements (GHS)

Flucetosulfuron Chemical Properties,Usage,Production

Uses

Flucetosulfuron is a sulfonylurea herbicide used for rice.

Definition

ChEBI: Flucetosulfuron is a member of pyridines and a sulfonamide.

Agricultural Uses

Details of flucetosulfuron (LGC-42153) were presented at the BCPC Conference in 2003 by the research group from LG Life Sciences Ltd. and KRICT and was commercialized in 2004. It can be used for the control of broadleaf weeds, some grass weeds, and also sedges in rice and cereal crops. In rice, flucetosulfuron provides excellent control of E. crus‐galli, which is usually not controlled by other commercial rice sulfonylurea products. In addition, the following weeds are controlled at an application rate of 10-20 g a.i. ha−1: Alisma spp., A. coccinea, C. difformis, Fimbristylis spp., Lindernia spp., M. vaginalis, Rorippa silvestri, R. indica, S. juncoides, S. mucronatus, and S. maritimus. At a higher rate of 20-30 g a.i. ha−1, a greater than 90% control of Aeschynomene indica, B. umbellatus, Eleocharis kuroguwai, S. pygmaea, S. trifolia, and Sparganium erectum is achieved by flucetosulfuron, with a high crop safety margin when applied to soil or foliage in direct‐seeded or transplanted rice.
In cereal crops, flucetosulfuron at a rate of 20-30 g a.i. ha−1 shows excellent activity against G. aparine and other broadleaf weeds, such as C. bursa‐pastoris, G. tetrahit, L. purpureum, Matricaria spp., M. arvensis, P. rhoeas, Raphanus raphanistrum, S. vulgaris, S. arvensis, S. media, and T. arvense while being safe to use in wheat and barley at up to three times the recommended application rate.