Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane Chemical Properties

Melting point:

<0°C

Boiling point:

310 °C(lit.)

Density 

1.065 g/mL at 25 °C(lit.)

vapor pressure 

0.46Pa at 25℃

refractive index 

n20/D 1.451(lit.)

Flash point:

>230 °F

storage temp. 

under inert gas (nitrogen or Argon) at 2-8°C

form 

liquid

Specific Gravity

1.065

color 

Colorless to Almost colorless

Water Solubility 

1.4g/L at 20℃

Hydrolytic Sensitivity

7: reacts slowly with moisture/water

BRN 

8980119

InChIKey

DQZNLOXENNXVAD-UHFFFAOYSA-N

LogP

2.5 at 20℃

CAS DataBase Reference

3388-04-3(CAS DataBase Reference)

NIST Chemistry Reference

1-[2-(Trimethoxysilyl)ethyl]cyclohexane-3,4-epoxide(3388-04-3)

EPA Substance Registry System

3,4-Epoxycyclohexylethyltrimethoxysilane (3388-04-3)

Safety Information

Hazard Codes 

T

Risk Statements 

45-46-45/46

Safety Statements 

53-23-36/37/39-45

WGK Germany 

3

RTECS 

VV4000000

F 

3-10

TSCA 

Yes

HS Code 

29319090

Toxicity

LD50 oral in rat: 8mL/kg

MSDS

• Language:English Provider:SigmaAldrich

Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane Usage And Synthesis

Uses

Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber–epoxidized vegetable oil matrix composite materials was analyzed.Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane can be used as a silane based coupling agent to functionalize a variety of substrates. It modifies the surface to improve the dispersion of nanoparticles. It can be used as an adhesion promoter by treating the precursor material with epoxy silanes.

Uses

Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of:

• a photoacid generator activated by two photon excitation.
• nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation.

Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber–epoxidized vegetable oil matrix composite materials was analyzed.

Application

Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of:a photoacid generator activated by two photon excitation.nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation.

Flammability and Explosibility

Non flammable

Synthesis

The apparatus of Example B was charged with 148.8 g (1.2 mol) of 1-vinyl-3,4-epoxycyclohexane, 1.3 g of a carboxylic acid promoter, and 0.15 ml of 10% chloroplatinic acid catalyst solution. The flask contents were heated to 89?? C. and dropwise addition of 122.8 g {[1.0 mol) of trimethoxysilane was begun. The reaction temperature was controlled at 90??-95?? C. with an ice bath. Reaction was maintained at that temperature for half an hour after completion of addition, which took 18 minutes. Analysis by gas chromatography showed a yield of 90% of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane. This example demonstrates a standard preparation of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane using commercial chloroplatinic acid.

Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane(3388-04-3)Related Product Information

• N-(Triethoxysilylpropyl)urea
• Phenyltriethoxysilane
• 3-Chloropropyltriethoxysilane
• 4-METHYL-1,2-CYCLOHEXENE OXIDE
• ETHYLTRIMETHOXYSILANE
• Methyldimethoxysilane
• Methyltrimethoxysilane
• N-OCTYLSILANE
• Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane
• 2-(3,4-Epoxycyclohexyl)ethyltriethoxysilane
• Trimethoxypropylsilane
• N-PENTYLSILANE
• N-BUTYLTRIMETHOXYSILANE
• Trimethoxyoctylsilane
• HEXAMETHYLENE OXIDE
• Cyclohexene oxide
• N-HEXYLTRIMETHOXYSILANE
• N-BUTYLSILANE