HEXACHLORODISILANE Chemical Properties

Melting point:

<0°C

Boiling point:

144-145.5 °C (lit.)

Density 

1.562 g/mL at 25 °C (lit.)

vapor pressure 

2.8hPa at 25℃

refractive index 

n20/D 1.475(lit.)

Flash point:

78°C

storage temp. 

below 5° C

solubility 

sol CHCl3, CH2Cl2, benzene, THF; reacts violently, producing toxic fumes, with H2O, alcohols.

form 

liquid

Specific Gravity

1.562

color 

Colorless to Almost colorless

Hydrolytic Sensitivity

8: reacts rapidly with moisture, water, protic solvents

Stability:

Stable, but reacts violently with water. Moisture sensitive. May be shock sensitive. Incompatible with water, moisture, acids, strong bases, oxidizing agents, alcohols.

CAS DataBase Reference

13465-77-5(CAS DataBase Reference)

EPA Substance Registry System

Disilane, hexachloro- (13465-77-5)

Safety Information

Hazard Codes 

C

Risk Statements 

14-34

Safety Statements 

26-36/37/39-45

RIDADR 

UN 2987 8/PG 2

WGK Germany 

3

F 

3-10-21

TSCA 

Yes

HazardClass 

8

PackingGroup 

II

HS Code 

28121049

MSDS

• Language:English Provider:ACROS
• Language:English Provider:SigmaAldrich

HEXACHLORODISILANE Usage And Synthesis

Chemical Properties

Hexachlorodisilane is a colourless liquid, it is highly sensitive to moisture, and when exposed to air or water, it readily reacts, making it essential to handle the compound in a controlled, moisture-free environment.

Physical properties

bp 144–145.5 °C; d 1.562 g/cm3.

Uses

Hexachlorodisilane can be used in deoxygenation and desulfurization of phosphine oxides, phosphine sulfides, and amine oxides; reducing agent for nitro groups and sulfur diimides.

Preparation

Hexachlorodisilane is prepared in the chlorination of silicides such as e.g. calcium silicide. Idealized syntheses are as follows: CaSi2 + 4 Cl2 → Si2Cl6 + CaCl2

Reactions

Hexachlorodisilane is a versatile chemical reagent that can be used in the following chemical reactions^[1-2]:
(1) When hexachlorodisilane is heated with a catalytic amount of triphenylphosphine or triphenylarsine, it decomposes according to the equation nSi2Cl6 = nSiCl4 + (SiCl2)n. It does not react with trifluoromethylphosphine. Hexabromodisilane is also decomposed by trimethylamine.
(2) Hexachlorodisilane reacts with hydrogen chloride in the presence of pyridine, and the reaction formula is:
Si2Cl6 + 2HCl = 2SiCl4 + H2.
(3) Excess hydrogen bromide and hexachlorodisilane produce a mixture of hydrogen chloride and hydrogen bromide.
(4) Hexachlorodisilane reacts with methyl chloride in the presence of triphenylphosphine to produce a mixture of methyltrichlorosilane and silicon tetrachloride. When hexachlorodisilane and methyl bromide are heated together in the presence of triphenylphosphine, a mixture of methyl chloride and bromine is produced.
(5) Hexachlorodisiloxane reacts with sulfur trioxide to produce silicon dioxide, sulfur dioxide and hexachlorodisiloxane.

General Description

Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.

Flammability and Explosibility

Non flammable

References

[1] H.J. EMELéUS; Muhammad T. Reaction of hexachlorodisilane with bases and alkyl halides[J]. Journal of Inorganic and Nuclear Chemistry, 1967. DOI:10.1016/0022-1902(67)80468-8.
[2] B. S. SURESH  D. P. Preparation of Hexafluorodisilane and Reactions of Hexafluorodisilane and Hexachlorodisilane with Sulfur Trioxide[J]. ACS Applied Electronic Materials, 1985. DOI:10.1246/BCSJ.58.1867.

HEXACHLORODISILANE(13465-77-5)Related Product Information

• Trimethyl phosphate
• Hydrogen fluoride
• HEXAPHENYLDISILANE
• Trichlorosilane
• HEXACHLORODISILANE
• DISILANE
• pentachlorodisilane