TRIS(DIMETHYLAMINO)SILANE Property

Melting point:

<0°C

Boiling point:

145 °C

Density 

0,838 g/cm³

refractive index 

1.4247

Flash point:

25°C

pka

10.93±0.70(Predicted)

form 

liquid

color 

colorless to light yellow

Specific Gravity

0.84

Sensitive 

air sensitive, moisture sensitive

Hydrolytic Sensitivity

8: reacts rapidly with moisture, water, protic solvents

EPA Substance Registry System

N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7)

Safety

Hazard Codes 

F,C

Risk Statements 

10-36/37/38-52/53-34-29-20-15-11

Safety Statements 

16-26-36/37/39-45-43

RIDADR 

1993

WGK Germany 

3

RTECS 

VV5800000

TSCA 

Yes

Toxicity

rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989.

Hazard and Precautionary Statements (GHS)

Symbol(GHS)

Signal word

Danger

Hazard statements

H225Highly Flammable liquid and vapour

H261In contact with water releases flammable gas

H302Harmful if swallowed

H311Toxic in contact with skin

H314Causes severe skin burns and eye damage

H330Fatal if inhaled

Precautionary statements

P210Keep away from heat/sparks/open flames/hot surfaces. — No smoking.

P231+P232Handle under inert gas. Protect from moisture.

P280Wear protective gloves/protective clothing/eye protection/face protection.

P303+P361+P353IF ON SKIN (or hair): Remove/Take off Immediately all contaminated clothing. Rinse SKIN with water/shower.

P305+P351+P338IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

TRIS(DIMETHYLAMINO)SILANE Chemical Properties,Usage,Production

Uses

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

General Description

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