DIETHYLSILANE Property

Melting point:

-132°C

Boiling point:

56 °C (lit.)

Density 

0.681 g/mL at 25 °C (lit.)

refractive index 

n20/D 1.391(lit.)

Flash point:

−20 °F

storage temp. 

under inert gas (nitrogen or Argon) at 2-8°C

solubility 

Miscible with terahydrofuran, diethyl ether, 1,4-dioxane and benzene.

form 

liquid

Specific Gravity

0.683

Hydrolytic Sensitivity

3: reacts with aqueous base

Sensitive 

Air Sensitive

Merck 

14,3128

BRN 

1730902

CAS DataBase Reference

542-91-6(CAS DataBase Reference)

EPA Substance Registry System

Silane, diethyl- (542-91-6)

Safety

Hazard Codes 

F

Risk Statements 

11

Safety Statements 

16-23-24/25

RIDADR 

UN 1993 3/PG 2

WGK Germany 

1

TSCA 

Yes

HazardClass 

3

PackingGroup 

II

Hazard and Precautionary Statements (GHS)

Symbol(GHS)

Signal word

Danger

Hazard statements

H225Highly Flammable liquid and vapour

Precautionary statements

P210Keep away from heat/sparks/open flames/hot surfaces. — No smoking.

DIETHYLSILANE Chemical Properties,Usage,Production

Description

Diethylsilane is a reagent used in the chemical vapor deposition of SiO2 for microelectronics. It is also used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It can also be used as a reductant in catalytic reduction of secondary amides to imines and secondary amines has been achieved using readily available iridium catalysts such as [Ir(COE)2Cl]2. This system requires low catalyst loading and shows high efficiency and an appreciable level of functional group tolerance. As a reduction agent, it also be used to convert polycarboxylic acids into their corresponding alkanes.

Sources

Levy, R. A., J. M. Grow, and G. S. Chakravarthy. "Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane." Cheminform 24.28(1993):851-854.
https://www.alfa.com/en/catalog/L16468/
https://www.sigmaaldrich.com/catalog/product/aldrich/423815?lang=en&region=US
https://pubs.acs.org/doi/full/10.1021/ja304547s#citing
Nimmagadda, Rama D., and C. Mcrae. Cheminform 37.35(2006):3505-3508.

Uses

Diethylsilane is used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It is also used in the chemical vapor deposition of SiO2 for microelectronics.

Application

Used in the ‘in-situ’ preparation of diborane and haloboranes.