Basic information Uses Safety Supplier Related

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98

Basic information Uses Safety Supplier Related

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Basic information

Product Name:
TRIS(DIMETHYLAMIDO)GALLIUM(III) 98
Synonyms:
  • Bis[miu-(N-Methylmethanaminato)]tetrakis(N-methylmethanaminato)digallium
  • Hexakis(dimethylamido)digallium
  • Tris(dimethylamino)gallane
  • Bis(diMethylaMino)tetrakis(diMethylaMino)digalliuM,98%
  • Tris(diMethylaMino)galliuM(III) diMer, 99.9% (Metals basis)
  • tris(dimethylamido)gallium(iii)
  • TRIS(DIMETHYLAMIDO)GALLIUM(III) 98
  • Tris(dimethylamino)gallium(III) dimer
CAS:
57731-40-5
MF:
C12H36Ga2N6
MW:
403.91
EINECS:
200-287-4
Product Categories:
  • GalliumVapor Deposition Precursors
  • Catalysis and Inorganic Chemistry
  • Chemical Synthesis
  • Gallium
  • Precursors by Metal
  • organometallic complex
Mol File:
57731-40-5.mol
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TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Chemical Properties

Melting point:
104-105.5 °C(lit.)
Boiling point:
55.7 °C760 mm Hg
Flash point:
56 °C
form 
crystal
color 
white
Water Solubility 
Miscible with Water.
Sensitive 
Moisture Sensitive
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Safety Information

Hazard Codes 
F,C
Risk Statements 
11-14-34
Safety Statements 
16-26-36/37/39-45
RIDADR 
UN 2925 4.1/PG 2
WGK Germany 
3
HazardClass 
4.3
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TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Usage And Synthesis

Uses

Tris(dimethylamido)gallium(III) can be used in the following fields:

  1. Reagent used for the growth of gallium oxide films via the reaction with alcohols or water.
  2. Complex used for the ALD of gallium oxide films.
  3. Complex used in a new pyrolysis route to GaN quantum dots.
  4. Complex used for the generation of monodispersed, colloidal gallium nanoparticles.
  5. Complex used for the atomic layer deposition of gallium sulfide films. 

Uses

Gallium nitride film precursor. Used as Reagent.

General Description

Atomic number of base material: 31 Gallium

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98Supplier

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