PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY& Property

Melting point:

108-112 °C(lit.)

Boiling point:

>205°C

Density 

1.09±0.1 g/cm3(Predicted)

Flash point:

>230 °F

storage temp. 

below 5° C

Hydrolytic Sensitivity

3: reacts with aqueous base

Safety

WGK Germany 

3

TSCA 

No

Hazard and Precautionary Statements (GHS)

PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY& Chemical Properties,Usage,Production

Uses

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.

General Description

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.